Ravikiran Attota

发表

New method to enhance overlay tool performance

Egon Marx, Mark P. Davidson, Richard M. Silver, 2003, SPIE Advanced Lithography.

Evaluation of New In-Chip and Arrayed Line Overlay | NIST

Mark P. Davidson, Richard M. Silver, Robert D. Larrabee, 2004 .

Evaluation of new in-chip and arrayed line overlay target designs

Egon Marx, Mark P. Davidson, Richard M. Silver, 2004, SPIE Advanced Lithography.

New Method to Enhance Overlay Tool Performance | NIST

Egon Marx, Mark P. Davidson, Richard M. Silver, 2003 .

Patterned defect and CD metrology by TSOM beyond the 22-nm node

Benjamin Bunday, Ravikiran Attota, Victor Vartanian, 2012, Advanced Lithography.

Scatterfield microscopy for extending the limits of image-based optical metrology.

Egon Marx, Jay Jun, Ravikiran Attota, 2007, Applied optics.

TSV reveal height and dimension metrology by the TSOM method

Richard A. Allen, Ravikiran Attota, Victor Vartanian, 2013, Advanced Lithography.

High-resolution optical overlay metrology

Egon Marx, Mark P. Davidson, Richard M. Silver, 2004, SPIE Advanced Lithography.

Through-focus or volumetric type of optical imaging methods: a review

Ravikiran Attota, R. Attota, 2018, Journal of biomedical optics.

Use of TSOM for sub-11nm node pattern defect detection and HAR features

Benjamin Bunday, Ravikiran Attota, Abraham Arceo, 2013, Advanced Lithography.

The Limits of Image-Based Optical Metrology | NIST

Bryan M. Barnes, Ronald G. Dixson, Richard M. Silver, 2006 .

Scatterfield microscopy using back focal plane imaging with an engineered illumination field

Heather Patrick, Bryan M. Barnes, Richard M. Silver, 2006, SPIE Advanced Lithography.

Model-based analysis of the limits of optical metrology with experimental comparisons

Egon Marx, Richard M. Silver, Ravikiran Attota, 2007, SPIE Optical Metrology.

Köhler illumination for high-resolution optical metrology

Richard M. Silver, Lowell P. Howard, Yeung Joon Sohn, 2006, SPIE Advanced Lithography.

Comparison of measured optical image profiles of silicon lines with two different theoretical models

Egon Marx, Mark P. Davidson, Richard M. Silver, 2002, SPIE Advanced Lithography.

Optical critical dimension measurement and illumination analysis using the through-focus focus metric

Ronald G. Dixson, Richard M. Silver, Ravikiran Attota, 2006, SPIE Advanced Lithography.

Optical through-focus technique that differentiates small changes in line width, line height, and sidewall angle for CD, overlay, and defect metrology applications

Bryan M. Barnes, Richard M. Silver, Ravikiran Attota, 2008, SPIE Advanced Lithography.

TSOM method for semiconductor metrology

Erik Novak, Ronald G. Dixson, Benjamin Bunday, 2011, Advanced Lithography.

Calibration strategies for overlay and registration metrology

Egon Marx, Mark P. Davidson, Richard M. Silver, 2003, SPIE Advanced Lithography.

Through-focus scanning optical microscopy

Ronald G. Dixson, Ravikiran Attota, Andras E. Vladár, 2011, Defense + Commercial Sensing.

Optimizing noise for defect analysis with through-focus scanning optical microscopy

Ravikiran Attota, John Kramar, 2016, SPIE Advanced Lithography.

Fundamental limits of optical critical dimension metrology: a simulation study

Egon Marx, Bryan M. Barnes, Benjamin Bunday, 2007, SPIE Advanced Lithography.

Residual layer thickness control and metrology in jet and flash imprint lithography

Shrawan Singhal, Ravikiran Attota, Sidlgata V. Sreenivasan, 2012, Advanced Lithography.

Optical illumination and critical dimension analysis using the through-focus focus metric method

Richard M. Silver, Ravikiran Attota, James Potzick, 2006, SPIE Optics + Photonics.

Calibrated Overlay Wafer Standard | NIST

Richard M. Silver, Michael T. Stocker, Ravikiran Attota, 2007 .

Through-focus scanning and scatterfield optical methods for advanced overlay target analysis

Lei Chen, Hui Zhou, Ronald Dixson, 2009, Advanced Lithography.

Noise analysis for through-focus scanning optical microscopy.

Ravikiran Attota, 2016, Optics letters.

Nanoparticle size and shape evaluation using the TSOM method

András E. Vladár, Ravikiran Attota, Bradley Damazo, 2012, Advanced Lithography.

Application of through-focus focus-metric analysis in high resolution optical metrology

Richard M. Silver, Robert D. Larrabee, Michael Bishop, 2005, SPIE Advanced Lithography.

Zero‐Order and Super‐Resolved Imaging of Arrayed Nanoscale Lines using Scatterfield Microscopy

Bryan M. Barnes, Richard M. Silver, Pete Lipscomb, 2007 .

Nanoscale Measurements With the TSOM Optical Method

Ravikiran Attota, 2010 .

Nanometrology using a through-focus scanning optical microscopy method

Richard M. Silver, Ravikiran Attota, 2011 .

Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node | NIST

Benjamin Bunday, Ravikiran Attota, Abraham Arceo, 2012 .

A method to determine the number of nanoparticles in a cluster using conventional optical microscopes

András E. Vladár, Ravikiran Attota, Hyeonggon Kang, 2015 .

Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis.

Ravikiran Attota, Thomas A Germer, Richard M Silver, 2008, Optics letters.

Nanoparticle size determination using optical microscopes

Richard Kasica, Ravikiran Attota, Hyeonggon Kang, 2014 .

Optical microscope angular illumination analysis.

Ravikiran Attota, Richard Silver, 2012, Optics express.

Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node

Benjamin Bunday, Ravikiran Attota, Victor Vartanian, 2013 .

Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy

Heather Patrick, Bryan M. Barnes, Ronald G. Dixson, 2008 .

Inspecting mask defects with through-focus scanning optical microscopy

Vibhu Jindal, Ravikiran Attota, 2013 .

Nanoscale Measurements with a Through-Focus Scanning-Optical-Microscope | NIST

Richard M. Silver, Thomas A. Germer, Ravikiran Attota, 2009 .

TSV Reveal height and bump dimension metrology by the TSOM method | NIST

Ndubuisi G. Orji, Richard A. Allen, Haesung Park, 2013 .

Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes

Ronald G. Dixson, Ravikiran Attota, R. Dixson, 2014 .