Keiichiro Tounai

Optimization of modified illumination for 0.25-um resist patterning

Keiichiro Tounai, Shuichi Hashimoto, Seiichi Shiraki, 1994, Advanced Lithography.

Practical 3D lithography simulation system

Keiichiro Tounai, Hirotomo Inui, Hirokatsu Kaneko, 1997, Advanced Lithography.

Optimization of Optical Parameters in KrF Excimer Laser Lithography for Quarter-Micron Lines Pattern (Special Issue on Quarter Micron Si Device and Process Technologies)

Keiichiro Tounai, Kunihiko Kasama, K. Kasama, 1994 .

Resolution improvement with annular illumination

Keiichiro Tounai, Kunihiko Kasama, Hiroyoshi Tanabe, 1992, Advanced Lithography.

Resolution improvement of isolated line pattern in quarter-micrometer level by layout-optimized assistant pattern method

Keiichiro Tounai, Naoaki Aizaki, 1996, Advanced Lithography.