A. Beverina

Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

M. Broekaart, Laurent Pain, Daniel Henry, 2003, SPIE Advanced Lithography.

Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)

M. Broekaart, F. Boeuf, S. Manakli, 2005, SPIE Advanced Lithography.

Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions

M. Broekaart, R. Faure, M. Jurdit, 2004, SPIE Advanced Lithography.