F. Leverd

Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

M. Broekaart, Laurent Pain, Daniel Henry, 2003, SPIE Advanced Lithography.

Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)

M. Broekaart, F. Boeuf, S. Manakli, 2005, SPIE Advanced Lithography.