Alexandra Krawicz

Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results

Yayi Wei, Lin Zhang, Mark Neisser, 2008, SPIE Advanced Lithography.

Hybrid photocathodes for solar fuel production: coupling molecular fuel-production catalysts with solid-state light harvesting and conversion technologies

Alexandra Krawicz, Diana Cedeno, Gary F Moore, 2015, Interface Focus.

Second-generation radiation sensitive developable bottom anti-reflective coatings (DBARC) and implant resists approaches for 193-nm lithography

Hengpeng Wu, Mark Neisser, Medhat A. Toukhy, 2007, SPIE Advanced Lithography.

Coater/developer and new underlayer application to sub-30nm process

Satoru Shimura, Shinichiro Kawakami, Naoki Shibata, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)

Yayi Wei, Mark Neisser, Meng Li, 2008 .