Sumathy Vasanthan

Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results

Yayi Wei, Lin Zhang, Mark Neisser, 2008, SPIE Advanced Lithography.

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Lin Zhang, Edward Ng, Mark Neisser, 2009, Advanced Lithography.

Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)

Yayi Wei, Mark Neisser, Meng Li, 2008 .