A. R. Neureuther

Efficient and innovative use of three-dimensional geometry services in IC topography and process flow simulations

R. H. Wang, A. R. Neureuther, 1995, 1995 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers.

Physically Based Modeling of Stress-Induced Variation in Nanoscale Transistor Performance

Tsu-Jae King Liu, Nuo Xu, A. R. Neureuther, 2011, IEEE Transactions on Device and Materials Reliability.

Extracting solid conductors from a single triangulated surface representation for interconnect analysis

J. F. Sefler, A. R. Neureuther, 1996 .

The Intertool Profile Interchange Format

M. L. Heytens, A. S. Wong, A. R. Neureuther, 1990, Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits.

Propagation effects of partial coherence in optical lithography

A. R. Neureuther, R. J. Socha, A. Neureuther, 1996 .

Optical printability of defects in two‐dimensional patterns

A. R. Neureuther, K. K. H. Toh, Bachvan Huynh, 1988 .

The use of bias in electron beam lithography for improved profile quality and linewidth control

C. H. Ting, M. G. Rosenfield, A. R. Neureuther, 1981 .