Michael Totzeck

Exposure method and projection exposure system for the execution of the procedure

Toralf Gruner, Daniel Kraehmer, Michael Totzeck, 2003 .

Modeling polarization for hyper-NA lithography tools and masks

Kafai Lai, Bernhard Kneer, Michael Totzeck, 2007, SPIE Advanced Lithography.

Special System Examples and Applications

Herbert Gross, Michael Totzeck, Wolfgang Singer, 2005 .

The impact of projection lens polarization properties on lithographic process at hyper-NA

Michael Totzeck, Emil Schmitt-Weaver, Bernd Geh, 2007, SPIE Advanced Lithography.

Image Examples of Selected Objects

Herbert Gross, Michael Totzeck, Wolfgang Singer, 2005 .

Radiometric consistency in source specifications for lithography

Kafai Lai, Michael Totzeck, Alan E. Rosenbluth, 2008, SPIE Advanced Lithography.