Victor Vartanian

Scatterometry for EUV lithography at the 22-nm node

Warren Montgomery, Xiaoping Liu, Cecilia Montgomery, 2011, Advanced Lithography.

Gaps analysis for CD metrology beyond the 22nm node

Aaron Cordes, Benjamin Bunday, Thomas A. Germer, 2013, Advanced Lithography.

Metrology needs for through-silicon via fabrication

Richard A. Allen, Larry Smith, Klaus Hummler, 2014 .

Patterned defect and CD metrology by TSOM beyond the 22-nm node

Benjamin Bunday, Ravikiran Attota, Victor Vartanian, 2012, Advanced Lithography.

Conductive carbon nanotubes for semiconductor metrology

Vladimir Mancevski, Victor Vartanian, Paul McClure, 2010, NanoScience + Engineering.

TSV reveal height and dimension metrology by the TSOM method

Richard A. Allen, Ravikiran Attota, Victor Vartanian, 2013, Advanced Lithography.

Surface-sensitive strain analysis of Si/SiGe line structures by Raman and UV-Raman spectroscopy

Ehrenfried Zschech, Peter Hermann, Victor Vartanian, 2009, NanoScience + Engineering.

Photo-reflectance characterization of USJ activation in millisecond annealing

Victor Vartanian, Will Chism, Michael Current, 2009, NanoScience + Engineering.