Mary T. Zawadzki

A 65-nm node SRAM solution using alt-PSM with ArF lithography

Geert Vandenberghe, Artur Balasinski, Frank A.J.M. Driessen, 2004, SPIE Advanced Lithography.

Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring

Arthur D. Klaum, Chidam Kallingal, Mary T. Zawadzki, 2003, SPIE Advanced Lithography.

Conversion from 50 KeV to DUV mask writer for 90-nm technology critical layers

Peter D. Buck, Yonghong Yang, Curt Jackson, 2004, SPIE Advanced Lithography.