Prakash Krishnan

A 65-nm node SRAM solution using alt-PSM with ArF lithography

Geert Vandenberghe, Artur Balasinski, Frank A.J.M. Driessen, 2004, SPIE Advanced Lithography.

193-nm haze contamination: a close relationship between mask and its environment

Christian Chovino, Laurent Dieu, Eric Johnstone, 2003, SPIE Photomask Technology.

Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring

Arthur D. Klaum, Chidam Kallingal, Mary T. Zawadzki, 2003, SPIE Advanced Lithography.

DUV mask writer for BEOL 90-nm technology layers

Nazneen Jeewakhan, Peter D. Buck, Curt Jackson, 2003, SPIE Photomask Technology.

Conversion from 50 KeV to DUV mask writer for 90-nm technology critical layers

Peter D. Buck, Yonghong Yang, Curt Jackson, 2004, SPIE Advanced Lithography.

Advanced Write Tool Effects on 100-nm Node OPC

Kent H. Nakagawa, Peter D. Buck, Kent G. Green, 2002, Photomask Technology.

Production of Lovastatin by Wild Strains of Aspergillus terreus

Prakash Krishnan, V. Maheshwari, P. Krishnan, 2011, Natural product communications.