Denis Shamiryan

发表

Introducing novel metal gate materials for decananometer CMOS in the agile fab: a case study

Wim Deweerd, Tom Schram, Gabriela Catana, 2004 .

Influence of crystallographic orientation on dry etch properties of TiN

Denis Shamiryan, Vasile Paraschiv, W. Boullart, 2006 .

Selective Epitaxy of Si/SiGe to Improve pMOS Devices by Recessed Source/Drain and/or Buried SiGe Channels

Akira Inoue, Rita Rooyackers, Denis Shamiryan, 2006 .

Effect of quartz window temperature on plasma composition during STI etch

Denis Shamiryan, W. Boullart, A. I. Mochalov, 2008, International Conference on Micro- and Nano-Electronics.

Automated approach to the analysis of geometric parameters of MEMS elements

Denis Shamiryan, Nikita Izrailev, Artem Kazachkov, 2019, International Conference on Micro- and Nano-Electronics.

Effect of Porogen Residue on Chemical, Optical, and Mechanical Properties of CVD SiCOH Low-k Materials

Denis Shamiryan, Stefan De Gendt, Kris Vanstreels, 2009 .

Low dielectric constant materials for microelectronics

Karen Maex, Denis Shamiryan, Sywert Brongersma, 2003 .

Spacer defined FinFET: Active area patterning of sub-20nm fins with high density

Rita Rooyackers, Denis Shamiryan, Nadine Collaert, 2007 .

Cleaning Challenges of High‐κ/Metal Gate Structures

Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, 2011 .

Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques

Naoto Horiguchi, Denis Shamiryan, Malgorzata Jurczak, 2011 .

Effects of various plasma pretreatments on 193 nm photoresist and linewidth roughness after etching

Han-Ku Cho, Denis Shamiryan, Werner Boullart, 2006 .

Diffusion of solvents in thin porous films

Karen Maex, Denis Shamiryan, W. Boullart, 2007 .

Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma

Karen Maex, Denis Shamiryan, Serge Vanhaelemeersch, 2002 .

Improving mechanical robustness of ultralow-k SiOCH plasma enhanced chemical vapor deposition glasses by controlled porogen decomposition prior to UV-hardening

Denis Shamiryan, S. De Gendt, Kris Vanstreels, 2010 .

Low-k dielectric materials

Karen Maex, Denis Shamiryan, Francesca Iacopi, 2004 .

Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films

Jean-Pierre Celis, Karen Maex, Denis Shamiryan, 2004 .

Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions

Karen Maex, Denis Shamiryan, Serge Vanhaelemeersch, 2002 .

Factors affecting an efficient sealing of porous low-k dielectrics by physical vapor deposition Ta(N) thin films

Karen Maex, Denis Shamiryan, Bert Brijs, 2002 .