Sangwook Kim

Stray-light implementation in optical proximity correction (OPC)

Insung Kim, Yong-Jin Chun, Young-Chang Kim, 2007, Photomask Japan.

Optical proximity correction for elongated contact-hole printing

Seong-Woon Choi, Young-Chang Kim, Sooryong Lee, 2008, SPIE Advanced Lithography.

Merged contact OPC using pattern type specific modeling and correction

Sungsoo Suh, Changjin Kang, Sangwook Kim, 2007, Photomask Japan.

Thread scheduling for GPU-based OPC simulation on multi-thread

Jisuk Hong, Heejun Lee, Hwansoo Han, 2018, Advanced Lithography.

An Asynchronous Sampling-Based 128 $\times$ 128 Direct Photon-Counting X-Ray Image Detector with Multi-Energy Discrimination and High Spatial Resolution

Seung-Tak Ryu, Hyun-Sik Kim, Gyu-Hyeong Cho, 2013, IEEE Journal of Solid-State Circuits.

OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Jonathan Cobb, Young-Chang Kim, Sooryong Lee, 2007, SPIE Advanced Lithography.