Jootae Moon

发表

Stray-light implementation in optical proximity correction (OPC)

Insung Kim, Yong-Jin Chun, Young-Chang Kim, 2007, Photomask Japan.

Measuring flare and its effect on process latitude

Jungchul Park, Hoyoung Kang, Jootae Moon, 1997, Advanced Lithography.

OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Jonathan Cobb, Young-Chang Kim, Sooryong Lee, 2007, SPIE Advanced Lithography.

Real-time monitoring of plasma flickering in high pressure electronegative discharge

Changjin Kang, Jootae Moon, Yongjin Kim, 2006, 2006 IEEE International Symposium on Semiconductor Manufacturing.

Pattern Displacement Error Under Off-Axis Illumination

Nakgeuon Seong, Hoyoung Kang, Jongwook Kye, 1998, Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135).