Cathy Cai

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

William D. Hinsberg, Chris Bencher, Hoa D. Truong, 2011, Advanced Lithography.

Defect gallery and bump defect reduction in the self Aligned Double Patterning module

Chris Ngai, Cathy Cai, Deenesh Padhi, 2010, 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).