Shimpei Tsujikawa

发表

Line roughness improvements on self-aligned quadruple patterning by wafer stress engineering

Akiteru Ko, Kazuya Okubo, Eric Liu, 2018, Advanced Lithography.

Positive charge generation due to species of hydrogen during NBTI phenomenon in pMOSFETs with ultra-thin SiON gate dielectrics

Shimpei Tsujikawa, Jiro Yugami, J. Yugami, 2005, Microelectron. Reliab..

Control of nitrogen profile in radical nitridation of SiO2 films.

Tadahiro Ohmi, Shimpei Tsujikawa, Akinobu Teramoto, 2004 .

Control of Nitrogen Depth Profile and Chemical Bonding State in Silicon Oxynitride Films Formed by Radical Nitridation

Tadahiro Ohmi, Shimpei Tsujikawa, Akinobu Teramoto, 2005 .