Daniel Miller

Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report

Will Conley, Paul Zimmerman, Charles R. Chambers, 2003, SPIE Advanced Lithography.

Student guide to community service in Lane County

Joseph Callahan, Daniel Miller, Sharon Schuman, 2005 .

Negative photoresist for 157-nm microlithography; a progress report

Will Conley, Paul Zimmerman, C. Grant Willson, 2002, SPIE Advanced Lithography.

Negative photoresist for 157-nm microlithography: a progress report

Will Conley, Paul Zimmerman, Charles R. Chambers, 2003, SPIE Advanced Lithography.

The Relative Impact of Anger and Efficacy on Collective Action is Affected by Feelings of Fear

Daniel Miller, Nyla R. Branscombe, N. Branscombe, 2009 .