C. Lorant

Spin-on metal oxide materials for N7 and beyond patterning applications

G. Mannaert, E. Altamirano-Sanchez, T. Hopf, 2017, Advanced Lithography.

Exploration of EUV-based self-aligned multipatterning options targeting pitches below 20nm

C. Lorant, S. Decoster, F. Lazzarino, 2019, Advanced Lithography.

12-EUV Layer Surrounding Gate Transistor (SGT) for Vertical 6-T SRAM: 5-nm-class Technology for Ultra-Density Logic Devices

D. Mocuta, J. Mitard, F. Masuoka, 2019, 2019 Symposium on VLSI Technology.