Hirotaka Sano

The solution to enhance i-line stepper applications by improviing process overlay accuracy

Yasuo Hasegawa, Ryo Sasaki, Seiya Miura, 2015, 2015 China Semiconductor Technology International Conference.

Utilization and Development of the Hotspot Analysis in the Ecomark

Hirotaka Sano, 2019 .

The solution to enhance i-line stepper applications by improving mix and match process overlay accuracy

Ryo Sasaki, Seiya Miura, Yasuo Hasegawa, 2014, Advanced Lithography.

Closure Effect on Interaction of Two Surface Cracks Under Cyclic Bending

Yoshitaka Wada, Masanori Kikuchi, Maigefeireti Maitireyimu, 2010 .

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm2 Pitch Dot Arrays

Sumio Hosaka, You Yin, Akihira Miyachi, 2008 .