Henning Haffner

发表

Lars W. Liebmann, Zachary Baum, Carlos Fonseca, 2006, SPIE Photomask Technology.

Christian Ruebekohl, Henning Haffner, Christian Rotsch, 2002, Photomask Technology.

Donald J. Samuels, Heinz Hoenigschmid, Henning Haffner, 2000 .

Jan Heumann, Wolfgang Dettmann, Henning Haffner, 2001, Photomask Japan.

Scott Halle, Allen H. Gabor, Klaus Herold, 2008, SPIE Advanced Lithography.

Zachary Baum, Scott Halle, Henning Haffner, 2007, SPIE Photomask Technology.

Zachary Baum, Scott Halle, Vito Dai, 2008, SPIE Advanced Lithography.

Anja Rosenbusch, Franklin D. Kalk, Shirley Hemar, 2003, SPIE Advanced Lithography.

Carlos Fonseca, Scott Halle, Jason Meiring, 2007, SPIE Advanced Lithography.

Aasutosh Dave, Jason Meiring, Gabriel Berger, 2011, Advanced Lithography.

Martin Ostermayr, Bradley Morgenfeld, Henning Haffner, 2011, Advanced Lithography.

Martin Ostermayr, Ian Stobert, Bradley Morgenfeld, 2011, 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

Armin Semmler, Henning Haffner, Ines Anke, 2003, SPIE Advanced Lithography.