Jeonkyu Lee

Abnormal patterning analysis using actual lens and illumination source data

Donggyu Yim, Hyunjo Yang, James Guerrero, 2005, SPIE Advanced Lithography.

OPC model accuracy study using high volume contour based gauges and deep learning on memory device

Meng Liu, Lei Wang, Young-Seok Kim, 2019, Advanced Lithography.

Mask compensation for process flare in 193nm very low k1 lithography

Donggyu Yim, Sung-Woo Lee, Kevin Lucas, 2013, Advanced Lithography.

Study of OPC accuracy by illumination source types

Donggyu Yim, Sungki Park, Daejin Park, 2009, Lithography Asia.

High NA polarized light lithography for 0.29k1 process

Alek C. Chen, Donggyu Yim, Chanha Park, 2006, SPIE Advanced Lithography.

Characterizing optical proximity effect difference among exposure tools

Donggyu Yim, Jin-Woong Kim, Hyunjo Yang, 2006, SPIE Advanced Lithography.