Dario L. Goldfarb

发表

Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists

Hiroshi Ito, Vivek M. Prabhu, Michael X. Wang, 2004, SPIE Advanced Lithography.

Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts

Wen-li Wu, Vivek M. Prabhu, Eric K. Lin, 2003, SPIE Advanced Lithography.

Characterization of thin and ultrathin polymer and resist films

Wen-li Wu, Eric K. Lin, Dario L. Goldfarb, 2001, SPIE Advanced Lithography.

Polymer dynamics and diffusive properties in ultrathin photoresist films

Vivek M. Prabhu, Wen-Li Wu, Dario L. Goldfarb, 2003, SPIE Advanced Lithography.

Aqueous developers for positive tone ultrathin chemically amplified EUV resists

Dario L. Goldfarb, Bharat Kumar, B. Kumar, 2018, Advanced Lithography.

Deprotection volume characteristics and line-edge morphology in chemcially amplified resists

Wen-li Wu, Vivek M. Prabhu, Dario L. Goldfarb, 2003, SPIE Advanced Lithography.

Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)

Hiroshi Ito, Dario L. Goldfarb, Sean D. Burns, 2005, SPIE Advanced Lithography.

Chain conformation in ultrathin polymer films

Wen-li Wu, Eric K. Lin, Dario L. Goldfarb, 1999, Nature.

Thermomechanical behavior of EUV pellicle under dynamic exposure conditions

Dario L. Goldfarb, Max O. Bloomfield, Matthew E. Colburn, 2016, SPIE Advanced Lithography.

Fabrication of a full-size EUV pellicle based on silicon nitride

Dario L. Goldfarb, D. Goldfarb, 2015, SPIE Photomask Technology.

Measurements of water distribution in thin lithographic films

Wen-li Wu, Vivek M. Prabhu, Bryan D. Vogt, 2004, SPIE Advanced Lithography.

Acid generation efficiency: EUV photons versus photoelectrons

Dario L. Goldfarb, Martin Glodde, Ali Afzali-Ardakani, 2016, SPIE Advanced Lithography.

Rinse additives for defect suppression in 193-nm and 248-nm lithogrophy

Dario L. Goldfarb, Marie Angelopoulos, Sean D. Burns, 2004, SPIE Advanced Lithography.

X-ray absorption spectroscopy to probe interfacial issues in photolithography

Wen-li Wu, Dario L. Goldfarb, Marie Angelopoulos, 2003, SPIE Advanced Lithography.

Studies of acid diffusion in low Ea chemically amplified photoresists

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2005, SPIE Advanced Lithography.

Thin film confinement effects on the thermal properties of model photoresist polymers

Wen-li Wu, Eric K. Lin, Dario L. Goldfarb, 2001 .

Positive Resists Based on Non-polymeric Macromolecules

Hiroshi Ito, Dario L. Goldfarb, Sean D. Burns, 2005 .

Measurements of acid generation by extreme ultraviolet irradiation in lithographic films

Gregory M. Wallraff, Dario L. Goldfarb, Gregory Denbeaux, 2007 .

Trilayer Development for 193 nm Immersion Lithography

Dario L. Goldfarb, Naftali E. Lustig, Sean D. Burns, 2007 .

Confinement effects on the spatial extent of the reaction front in ultrathin chemically amplified photoresists

Wen-li Wu, Eric K. Lin, Dario L. Goldfarb, 2001 .

Formation of Deprotected Fuzzy Blobs in Chemically Amplified Resists

Wen-li Wu, Eric K. Lin, Dario L. Goldfarb, 2004 .

Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse

Juan J. de Pablo, Dario L. Goldfarb, Marie Angelopoulos, 2000 .

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Gregg M. Gallatin, Dario L. Goldfarb, Marie Angelopoulos, 2004 .

Are extreme ultraviolet resists ready for the 32nm node

Yayi Wei, Warren Montgomery, Dario L. Goldfarb, 2007 .

Patterning Material Challenges for Improving EUV Stochastics

Dario L. Goldfarb, Jennifer Church, Luciana Meli, 2019, Journal of Photopolymer Science and Technology.

Pathway to sub-30nm Resolution in EUV Lithography

Yayi Wei, Warren Montgomery, Dario L. Goldfarb, 2007 .

Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2004 .