Yong Keng Goh

Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

Warren Montgomery, Bruce W. Smith, Paul Zimmerman, 2010, Advanced Lithography.

Sensitive polysulfone based chain scissioning resists for 193nm lithography

Warren Montgomery, Neal Lafferty, Bruce W. Smith, 2011, Advanced Lithography.

Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity

Paul Zimmerman, Lan Chen, Andrew K. Whittaker, 2009, Advanced Lithography.

Polysulfone based non-CA resists for 193 nm immersion lithography: Effect of increasing polymer absorbance on sensitivity

Yong Keng Goh, P. Zimmerman, A. Whittaker, 2011 .

Novel Approach to Tailoring Molecular Weight Distribution and Structure with a Difunctional RAFT Agent

Yong Keng Goh, Michael J. Monteiro, M. Monteiro, 2006 .

Aqueous developable dual switching photoresists for nanolithography

Warren Montgomery, Bruce W. Smith, Andrew K. Whittaker, 2012 .

Synthesis of Monocyclic and Linear Polystyrene Using the Reversible Coupling/Cleavage of Thiol/Disulfide Groups

Yong Keng Goh, S. Perrier, M. Monteiro, 2006 .

Versatile synthetic approach to reversible crosslinked polystyrene networks via RAFT polymerization

Yong Keng Goh, A. Whittaker, M. Monteiro, 2007 .