Doug Anberg

A study of feed-forward strategies for overlay control in lithography processes using CGS technology

Doug Anberg, David M. Owen, Byoung-Ho Lee, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Process tool monitoring and matching using interferometry technique

Doug Anberg, David M. Owen, Eric Bouche, 2016, SPIE Advanced Lithography.

Wafer-shape based in-plane distortion predictions using superfast 4G metrology

David Laidler, Richard van Haren, Leon van Dijk, 2017, Advanced Lithography.

The use of CGS technology in a 3D manufacturing environment

Doug Anberg, David M. Owen, Jeffrey Mileham, 2016, 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Intra-field stress impact on global wafer deformation

Richard van Haren, Leon van Dijk, Jan Hermans, 2019, Advanced Lithography.

Study of correlation between overlay and displacement measured by Coherent Gradient Sensing (CGS) interferometry

Yasushi Tanaka, Byoung-Ho Lee, Doug Anberg, 2016, SPIE Advanced Lithography.