Lorenz Nedelmann

Mask patterning for the 22nm node using a proton multi-beam projection pattern generator

Elmar Platzgummer, Hans Loeschner, Holger Sailer, 2008, Photomask Technology.

High resolution nanoimprint templates for dual damascene: fabrication and imprint results

Holger Sailer, Joerg Butschke, Mathias Irmscher, 2008, SPIE Advanced Lithography.

Extended process window using variable transmission PSM materials for 65 nm and 45 nm node

Ute Buttgereit, Mathias Irmscher, Corinna Koepernik, 2006, Photomask Japan.

Patterning of Ta/SiO2 high transmission EAPSM material for 193nm technology

Hans Willy Becker, Ute Buttgereit, Joerg Butschke, 2005, Photomask Japan.

Growth and surface alloying of Al on Au(111) at room temperature

Klaus Kern, Lorenz Nedelmann, Johannes V. Barth, 1997 .