J. Whittey

A new algorithm for SEM critical dimension measurements for differentiating between lines and spaces in dense line/space patterns without tone dependence

Jun Matsumoto, Y. Ogiso, M. Sekine, 2006, SPIE Photomask Technology.

Measurement sampling frequency impact on determining magnitude of pattern placement errors on photomasks

F. Laske, Seurien Chou, J. Whittey, 2009, Photomask Technology.