Kushlendra Mishra

Resist-slope aware modeling for mask process correction applications

Ingo Bork, Peter Buck, Linna Cong, 2019, Photomask Technology.

Accurate mask model for advanced nodes

Isabelle Schanen, Frank Sundermann, Ingo Bork, 2014, Photomask and Next Generation Lithography Mask Technology.

Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)

Jianliang Li, Ingo Bork, Peter Buck, 2019, Photomask Technology.

Machine learning guided curvilinear MPC

Ingo Bork, Peter Buck, Bhardwaj Durvasula, 2019, Photomask Technology.

Sensitivity analysis based SEM measurement down-sampling approach for mask process modeling applications

Peter Buck, Kushlendra Mishra, Ingo Bork, 2021, Photomask Technology.