Chan-Ha Park

CD uniformity improvement by active scanner corrections

Peter Vanoppen, Oscar Noordman, Jan B. van Schoot, 2002, SPIE Advanced Lithography.

Staggered pillar patterning using 0.33NA EUV lithography

Lieve Van Look, Geert Vandenberghe, Jeroen Van de Kerkhove, 2019, Advanced Lithography.

Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Jan B. van Schoot, Donggyu Yim, Hyun-Jo Yang, 2002, SPIE Advanced Lithography.

Measuring after etch overlay and characterizing tilt fingerprints in multi-tier 3D-NAND structures

Jaap Karssenberg, Dong-Hak Lee, Tjitte Nooitgedagt, 2019, Advanced Lithography.