Rick S. Farnbach
发表
Benjamin George Eynon,
Darren Taylor,
John V. Jensen,
2003,
SPIE Advanced Lithography.
Integrating RET and mask manufacturability in designs for local interconnect for sub-100-nm trenches
Nishrin Kachwala,
Travis E. Brist,
Rick S. Farnbach,
2004,
SPIE Photomask Technology.