George J. Cernigliaro

Dissolution Rate Modifying Chemistry: Interaction of Base-soluble and Base-insoluble Non-actinic Dyes With Novolak Polymers and Novolak-based Positive Photoresists

Pamela Turci, Michael F. Cronin, Thomas A. Fisher, 1989, Advanced Lithography.

High-resolution positive photoresists: novolac molecular weight and molecular weight distribution effects

Roger F. Sinta, Pamela Turci, Anthony Zampini, 1990, Advanced Lithography.

Non-chemically amplified 193-nm top surface imaging photoresist development: polymer substituent and polydispersity effects

Donald W. Johnson, Hyoung-Gi Kim, Myoung-Soo Kim, 1999, Advanced Lithography.