Angelique Raley

Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning

Yongan Xu, Akiteru Ko, Nelson Felix, 2018 .

Dry-plasma-free chemical etch technique for variability reduction in multi-patterning (Conference Presentation)

Richard A. Farrell, Akiteru Ko, Peter Biolsi, 2017, Advanced Lithography.

Material Innovation in the Era of Artificial Intelligence - A Case Study of Hf-Zr Systems

Robert D. Clark, Dina H. Triyoso, Gert Leusink, 2020, 2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).

EPE improvement thru self-alignment via multi-color material integration

Jeffrey T. Smith, Akiteru Ko, Carlos Fonseca, 2017, Advanced Lithography.

Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme

Peter Biolsi, Kaushik Kumar, Eric Liu, 2015, Advanced Lithography.