Michael W. Powell

Compact recycled beam source for XRL and EUVL exposure tools

R. M. Silzer, J. Theodore Cremer, Melvin A. Piestrup, 1998, Advanced Lithography.

Extremely narrow-bandwidth high-repetition-rate laser for high-NA step-and-scan tools

Rainer Paetzel, Juergen Kleinschmidt, Uwe Stamm, 1996, Advanced Lithography.

Alternative soft x-ray source for step-and-scan lithography

Melvin A. Piestrup, Michael W. Powell, L. W. Lombardo, 1996, Advanced Lithography.

Single-stepper soft x-ray source for step-and-scan tools

J. Theodore Cremer, Melvin A. Piestrup, Stanley Mrowka, 1997, Advanced Lithography.

High-repetition-rate lasers for advanced DUV exposure tools

Rainer Paetzel, Ulrich Rebhan, Michael W. Powell, 1994, Advanced Lithography.