Victor Soltwisch

发表

Comparison of CD measurements of an EUV photomask by EUV scatterometry and CD-AFM

Gaoliang Dai, Frank Scholze, Victor Soltwisch, 2013, Photomask Technology.

Status of EUV reflectometry at PTB

Andreas Fischer, Frank Scholze, Victor Soltwisch, 2013, Advanced Lithography.

EUV-angle resolved scatter (EUV-ARS): a new tool for the characterization of nanometre structures

Frank Scholze, Victor Soltwisch, Christian Laubis, 2018, Advanced Lithography.

Validation of optical constants in the EUV spectral range

Victor Soltwisch, Philipp Naujok, Qais Saadeh, 2019, Photomask Technology.

Imaging impact of multilayer tuning in EUV masks, experimental validation

Sudhar Raghunathan, Vicky Philipsen, Eric Hendrickx, 2014, Photomask Technology.

Selective measurement of small metrology targets using CD-GISAXS

Frank Scholze, Victor Soltwisch, Michael Krumrey, 2017, Photomask Technology.

Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle

Victor Soltwisch, Sven Burger, Frank Scholze, 2013, Optical Metrology.

Sensitivity analysis for the detection of pitchwalk in self-aligned quadruple patterning by GISAXS

Frank Scholze, Victor Soltwisch, Sebastian Heidenreich, 2020, Advanced Lithography.

Update on EUV radiometry at PTB

Christian Buchholz, Frank Scholze, Victor Soltwisch, 2016, SPIE Advanced Lithography.

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Obert Wood, Vicky Philipsen, Frank Scholze, 2015, Advanced Lithography.

Mask absorber for next generation EUV lithography

Patrick Jaenen, Vicky Philipsen, Victor Soltwisch, 2020, Photomask Technology.

Polarization sensitivity testing of off-plane reflection gratings

Hannah Marlowe, Victor Soltwisch, Christian Laubis, 2015, SPIE Optical Engineering + Applications.

Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing

Gaoliang Dai, Frank Scholze, Victor Soltwisch, 2015, SPIE NanoScience + Engineering.

Investigating surface structures by EUV scattering

Frank Scholze, Victor Soltwisch, Christian Laubis, 2017, Advanced Lithography.

Extracting dimensional parameters of gratings produced with self-aligned multiple patterning using grazing-incidence small-angle x-ray scattering

Victor Soltwisch, Martin Hammerschmidt, R. Joseph Kline, 2020 .

Determination of line profiles on nano-structured surfaces using EUV and x-ray scattering

Frank Scholze, Victor Soltwisch, Jan Pomplun, 2014, Photomask Technology.

Polarization resolved measurements with the new EUV ellipsometer of PTB

Andreas Fischer, Frank Scholze, Victor Soltwisch, 2015, Advanced Lithography.

Spatially resolved reflectometry for EUV optical components

Christian Buchholz, Frank Scholze, Victor Soltwisch, 2018, Photomask Technology.

Determination of line profiles on photomasks using DUV, EUV, and x-ray scattering

Frank Scholze, Victor Soltwisch, Bernd Bodermann, 2014, European Mask and Lithography Conference.

Grazing incidence x-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction

Victor Soltwisch, Martin Hammerschmidt, Burkhard Beckhoff, 2019, Optical Metrology.

Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering

Frank Scholze, Victor Soltwisch, Stefan Braun, 2015, SPIE Optical Systems Design.

Characterization of optical material parameters for EUV Lithography applications at PTB

Frank Scholze, Victor Soltwisch, Christian Laubis, 2015, European Mask and Lithography Conference.

Benchmarking Five Global Optimization Approaches for Nano-optical Shape Optimization and Parameter Reconstruction

Carsten Rockstuhl, Victor Soltwisch, Sven Burger, 2018, ACS Photonics.

Development of a scatterometry reference standard

Gaoliang Dai, Victor Soltwisch, Bernd Bodermann, 2014, Photonics Europe.

Nanometrology on gratings with GISAXS: FEM reconstruction and fourier analysis

Frank Scholze, Victor Soltwisch, Michael Krumrey, 2014, Advanced Lithography.

Simulation of polychromatic effects in high NA EUV lithography

Vicky Philipsen, Victor Soltwisch, Andreas Erdmann, 2021, Photomask Technology.

Identifying the type of line edge roughness using grazing-incidence x-ray fluorescence

Victor Soltwisch, Philipp Hönicke, Analía Fernández Herrero, 2021, Optical Metrology.

Study of novel EUVL mask absorber candidates

Patrick Jaenen, Vicky Philipsen, Victor Soltwisch, 2021 .

Invertible Neural Networks versus MCMC for Posterior Reconstruction in Grazing Incidence X-Ray Fluorescence

Gabriele Steidl, Victor Soltwisch, Nando Farchmin, 2021, SSVM.

GIXRF and machine learning as metrological tools for shape and element sensitive reconstructions of periodic nanostructures

Frank Siewert, Victor Soltwisch, Philipp Hönicke, 2021 .

Grazing Incidence Small Angle X-Ray Scattering ( GISAXS ) on Small Targets Using Large Beams

Frank Scholze, Victor Soltwisch, Michael Krumrey, 2018 .

Role of dynamic effects in the characterization of multilayers by means of power spectral density.

Frank Scholze, Victor Soltwisch, Christian Laubis, 2014, Applied optics.

Applicability of the Debye-Waller damping factor for the determination of the line-edge roughness of lamellar gratings.

Frank Scholze, Victor Soltwisch, Analía Fernández Herrero, 2019, Optics express.

Frank Scholze, Victor Soltwisch, Sven Burger, 2016 .

Reconstructing Detailed Line Profiles of Lamellar Gratings from GISAXS Patterns with a Maxwell Solver

Frank Scholze, Victor Soltwisch, Michael Krumrey, 2017, 1704.08032.

Modeling and empirical characterization of the polarization response of off-plane reflection gratings.

Hannah Marlowe, Frank Scholze, Victor Soltwisch, 2016, Applied optics.

Grazing-incidence small-angle X-ray scattering (GISAXS) on small periodic targets using large beams

Frank Scholze, Victor Soltwisch, Michael Krumrey, 2017, IUCrJ.