Juan Ferrera

发表

Nanostructures Technology, Research, and Applications

Günter Steinmeyer, Shanhui Fan, Mark L. Schattenburg, 1997 .

Limitations and solutions for the use of integrated λ/4-Shifted distributed Bragg resonators in wavelength-division multiplexing applications

Hermann A. Haus, Henry I. Smith, Vincent V. Wong, 1994, Integrated Optoelectronics.

Highly coherent electron-beam-written quarter-wave-shifted distributed Bragg resonators for channel-dropping filters

Henry I. Smith, Hermann A. Haus, Vincent V. Wong, 1995 .

An Innovative Tool for Fabricating Computer-Generated Holograms

Henry I. Smith, Feng Zhang, Juan Ferrera, 2013 .

Soft x-rays for deep sub-100 nm lithography, with and without masks

David Carter, Rajesh Menon, Henry I. Smith, 2000 .

Optical distributed-feedback channel-dropping filters: design and fabrication

Hermann A. Haus, Henry I. Smith, Jay N. Damask, 1993, Proceedings of LEOS '93.

Highly coherent gratings for optoelectronics : an application of spatial-phase-locked electron beam lithography

Juan Ferrera, 1994 .

An Introduction to Nonsmooth Analysis

Juan Ferrera, J. Ferrera, 2013 .

Every closed convex set is the set of minimizers of some ^{∞}-smooth convex function

Juan Ferrera, J. Ferrera, D. Azagra, 2002 .

Spatial‐phase‐locked electron‐beam lithography and x‐ray lithography for fabricating first‐order gratings on rib waveguides

Hermann A. Haus, Vincent V. Wong, Jay N. Damask, 1994 .

Proximal Calculus on Riemannian Manifolds

Juan Ferrera, J. Ferrera, D. Azagra, 2005 .

X-ray nanolithography: Extension to the limits of the lithographic process

Mark L. Schattenburg, Scott Daniel Hector, Martin Burkhardt, 1996 .

Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist

Mark L. Schattenburg, Caroline A. Ross, Thomas E. Murphy, 1999 .

Analyses of vector Gaussian beam propagation and the validity of paraxial and spherical approximations.

Juan Ferrera, R. Heilmann, M. Schattenburg, 2002, Journal of the Optical Society of America. A, Optics, image science, and vision.

Combining and matching optical, electron‐beam, and x‐ray lithographies in the fabrication of Si complementary metal–oxide–semiconductor circuits with 0.1 and sub‐0.1 μm features

Scott Silverman, Dimitri A. Antoniadis, Henry I. Smith, 1995 .

Spatial-phase locking with shaped-beam lithography

Mark L. Schattenburg, John G. Hartley, Timothy R. Groves, 2003 .

Proximal calculus on Riemannian manifolds, with applications to fixed point theory

Juan Ferrera, Daniel Azagra, 2004 .

Inf-convolution and regularization of convex functions on Riemannian manifolds of nonpositive curvature

Juan Ferrera, Daniel Azagra, 2005 .

High-coherence QWS gratings for optoelectronic devices: why spatial-phase-locked e-beam lithography is necessary

Hermann A. Haus, Vincent V. Wong, Jay N. Damask, 1994 .

Analysis of distortion in interferometric lithography

Mark L. Schattenburg, Henry I. Smith, Juan Ferrera, 1996 .

Spatial‐phase‐locked electron‐beam lithography: Initial test results

Erik H. Anderson, Volker Boegli, Vincent V. Wong, 1993 .

A holographic phase-shifting interferometer technique to measure in-plane distortion

Michael H. Lim, Kevin P. Pipe, Henry I. Smith, 1999 .

Viscosity solutions to second order partial differential equations on Riemannian manifolds

Juan Ferrera, Daniel Azagra, Beatriz Sanz, 2006 .