C. Holfeld

Detailed characterization of inspection tools: capabilities and limitations of the KLA 576

J. Heumann, R. Moses, C. Holfeld, 2005, SPIE Photomask Technology.

Actinic imaging of native and programmed defects on a full-field mask

I. Mochi, C. Holfeld, B. La Fontaine, 2010, Advanced Lithography.

EUVL reticle defectivity evaluation

C. Holfeld, B. La Fontaine, U. Okoroanyanwu, 2009, Advanced Lithography.

Limitations of optical reticle inspection for 45-nm node and beyond

C. Holfeld, J. Heumann, S. Teuber, 2006, SPIE Photomask Technology.