Chuen-Huei Yang

Implementation of double dipole lithography for 45-nm node poly and diffusion layer manufacturing with 0.93NA

Stephen Hsu, Yung-Feng Cheng, Meng-Hsiu Wu, 2007, Photomask Japan.

Human hepatocellular carcinoma diagnosis by multiphoton autofluorescence microscopy

Peter T. C. So, Chen-Yuan Dong, Hsuan-Shu Lee, 2010, BiOS.

Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

Maciej W. Rudzinski, Kong Son, Lantian Wang, 2004, SPIE Advanced Lithography.

Resist and oxide thickness effect on process window for 0.2-μm contact patterns with off-axis illumination and attenuated phase-shift mask

Chang-Ming Dai, Chuen-Huei Yang, 1998, Advanced Lithography.

Simulation and optimization of phase-shift masks for dense contact patterns with i-line illumination

Chang-Ming Dai, Chuen-Huei Yang, 1997, Advanced Lithography.

Customized off-axis illumination aperture filtering for sub-0.18-μm KrF lithography

Bruce W. Smith, Chien-Ming Wang, Tsai-Sheng Gau, 1999, Advanced Lithography.