Serrita A. McAuley

Etching 200-mm diameter SCALPEL masks with the ASE process

Stephen Hall, Gregory R. Bogart, Anthony E. Novembre, 2000, Advanced Lithography.

Performance enhancement and evaluation of deep dry etching on a production cluster platform

Mark E. McNie, Christopher Pickering, Fred Roozeboom, 2003, SPIE MOEMS-MEMS.

Silicon micromachining using a high-density plasma source

Serrita A. McAuley, J. Hopkins, H. Ashraf, 2001 .

Defining Conditions for the Etching of Silicon in an Inductive Coupled Plasma Reactor

G. Nicholls, Janet Hopkins, Alan Michael Hynes, 1999 .

ADVANCES IN DEEP ANISOTROPIC SILICON ETCH PROCESSING FOR MEMS

G. Nicholls, Janet Hopkins, Alan Michael Hynes, 2000 .