Shumay Dou Shang

发表

Jerome Belledent, Christophe Couderc, Frank Sundermann, 2004, SPIE Advanced Lithography.

James Word, Steffen Schulze, Wilhelm Maurer, 2004, SPIE Photomask Technology.

Shumay Dou Shang, Ian Stobert, Lianghong Yin, 2022, Advanced Lithography.

Shumay Dou Shang, Y. Zheng, J. Zhang, 2018, Journal of Biological Regulators and Homeostatic Agents.

Shumay Shang, Yuri Granik, Martin Niehoff, 2007, SPIE Photomask Technology.

Lars W. Liebmann, Yuri Granik, Rama N. Singh, 2003, SPIE Advanced Lithography.