George P. Mirth

Application-specific microscopy for half-micron metrology

Mircea V. Dusa, Guoqing Xiao, Frank S. Menagh, 1993, Advanced Lithography.

Process tube characterization method for photoresist and process comparison

Joseph C. Pellegrini, George P. Mirth, 1994, Advanced Lithography.

Determine submicron process window volume with simulator tools

Linard Karklin, Mircea V. Dusa, William M. Gouin, 1993, Advanced Lithography.

Reduction of post develop residue using optimal developer chemistry and develop/rinse processes

George P. Mirth, 1995 .

Profile defects in novolac/DNQ resists: I. formation of microgrooves

Peter Trefonas, Pamela Turci, Michael J. Monaghan, 1995, Advanced Lithography.