Martin Freitag

Line end shortening and application of novel correction algorithms in e-beam direct write

Christoph Hohle, Kang-Hoon Choi, Manuela Gutsch, 2011, European Mask and Lithography Conference.

Feasibility study of optical/e-beam complementary lithography

Philipp Jaschinsky, Christoph Hohle, Manuela Gutsch, 2012, Advanced Lithography.