Mikio Yamachika

Polymers for 157-nm photoresist applications: a progress report

Jeff D. Byers, Brian Osborn, C. Grant Willson, 2000, Advanced Lithography.

SCAA mask exposures and Phase Phirst designs for 100 nm and below

Takeaki Ebihara, Mikio Yamachika, Marc D. Levenson, 2001, SPIE Advanced Lithography.

Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists

C. Grant Willson, Kyle Patterson, Patrick Jean Paniez, 1999 .