Eung-Kil Kang

Positive and negative tone double patterning lithography for 50nm flash memory

Chang-Moon Lim, Keundo Ban, Seung-Chan Moon, 2006, SPIE Advanced Lithography.

Hardware, materials, and parameters optimization for improvement of immersion overlay

Chang-Moon Lim, Seung-Chan Moon, Won-Kwang Ma, 2007, SPIE Advanced Lithography.

Improvement of front-end process overlay in 60nm DRAM

Chang-Moon Lim, Seung-Chan Moon, Won-Kwang Ma, 2007, SPIE Advanced Lithography.

Issues and challenges of double patterning lithography in DRAM

Sunyoung Koo, Chang-Moon Lim, Seung-Chan Moon, 2007, SPIE Advanced Lithography.

Improvement of alignment and overlay accuracy on amorphous carbon layers

Chang-Moon Lim, Keundo Ban, Cheol-Kyu Bok, 2006, SPIE Advanced Lithography.