JoonYeon Cho

Spin-on metal oxide materials with high etch selectivity and wet strippability

Munirathna Padmanaban, Douglas McKenzie, Huirong Yao, 2016, SPIE Advanced Lithography.

Trend & prospects of haptic technology in mobile devices

Dong-Soo Kwon, Tae-Heon Yang, JoonYeon Cho, 2010, 2010 IEEE International Symposium on Industrial Electronics.

EUV underlayer materials for 22nm HP and beyond

Jianhui Shan, Mark Neisser, Guanyang Lin, 2011, Advanced Lithography.

A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014, Advanced Lithography.

Bottom anti-reflective coating for hyper NA process: theory, application and material development

Mark Neisser, Ralph R. Dammel, Guanyang Lin, 2008, Lithography Asia.

Progress in spin-on metal oxide hardmask materials for filling applications

Yi Cao, Munirathna Padmanaban, Douglas McKenzie, 2015, Advanced Lithography.

Underlayer and rinse materials for improving EUV resist performance

Munirathna Padmanaban, Takanori Kudo, Jin Li, 2013, Advanced Lithography.

Novel spin-on metal hardmask materials for filling applications

Edward Ng, Munirathna Padmanaban, Alberto D. Dioses, 2014, Advanced Lithography.

New spin-on metal hardmask materials for lithography processes

Munirathna Padmanaban, Dalil Rahman, Clement Anyadiegwu, 2013, Advanced Lithography.

Progress in Spin-on Hard Mask Materials for Advanced Lithography

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014 .