David Eon

Le diamant : matériau pour l’électronique du futur

Karine Isoird, Jocelyn Achard, David Eon, 2018 .

Trade-off for optimizing drift region of diamond power devices

Nicolas Rouger, David Eon, Gauthier Chicot, 2016 .

Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography

Evangelos Gogolides, Kim Dean, Panagiotis Argitis, 2003, SPIE Advanced Lithography.

Diamond Devices for Power Electronics

Pierre Lefranc, Pierre-Olivier Jeannin, Nicolas Rouger, 2017 .

Etching behavior of Si-containing polymers as resist materials for bilayer lithography: The case of poly-dimethyl siloxane

Angeliki Tserepi, Evangelos Gogolides, George P. Patsis, 2003 .

Zr/oxidized diamond interface for high power Schottky diodes

Pierre Muret, Etienne Gheeraert, David Eon, 2014 .