Zhaohua Feng

Simulating the effects of bake process parameters on resist thermal reflow

Roxann L. Engelstad, Edward G. Lovell, Jae-Won Lee, 2004, SPIE Photomask Technology.

Modeling thermal reflow of resist contact hole arrays

Roxann L. Engelstad, Edward G. Lovell, Jae-Won Lee, 2003, SPIE Photomask Technology.

EUV mask stress mapping by an experimental and hybrid finite element technique

Roxann L. Engelstad, Jaewoong Sohn, Andrew R. Mikkelson, 2003, SPIE Advanced Lithography.

Transient thermal distortions of x-ray mask membranes during exposure scanning

Franco Cerrina, Roxann L. Engelstad, Edward G. Lovell, 1998, Advanced Lithography.

Evaluation of intrinsic film stress distributions from induced substrate deformation

Roxann L. Engelstad, Jaewoong Sohn, Andrew R. Mikkelson, 2005 .

Effects of Surface Constraints on Stresses in Heteroepitaxial Films Grown on Compliant Substrates

Roxann L. Engelstad, Edward G. Lovell, Thomas F. Kuech, 2001 .

Stress-based prediction of dislocation generation in GaN during lateral epitaxial overgrowth

Roxann L. Engelstad, Edward G. Lovell, Thomas F. Kuech, 2002 .