David Ruede

Advances in the understanding of low molecular weight silicon formation and implications for control by AMC filters

Jürgen M. Lobert, Philip W. Cate, David Ruede, 2010, Advanced Lithography.

Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication

Monique Ercken, David Ruede, Tom Borgers, 2001, SPIE Advanced Lithography.

New filter media development for effective control of trimethysilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient

David Ruede, Anatoly Grayfer, Frank V. Belanger, 2007, SPIE Advanced Lithography.

Examination of the prevalence and abundance of noncondensable, nonreactive optical surface contaminants in the scanner environment

David Ruede, Anatoly Grayfer, Frank V. Belanger, 2004, SPIE Advanced Lithography.

Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator

Thomas Ostrom, Mats Ekberg, David Ruede, 2004, SPIE Advanced Lithography.

Protecting 248-nm and 193-ηm lithography from airborne molecular contamination during semiconductor fabrication

David Ruede, Oleg P. Kishkovich, Anatoly Grayfer, 2001, SPIE Advanced Lithography.