Steven Verhaverbeke

发表

A Model for the Electrochemical Deposition and Removal of Metallic Impurities on Si Surfaces (Special Issue on Scientific ULSI Manufacturing Technology)

Tadahiro Ohmi, Hitoshi Morinaga, Makoto Suyama, 1996 .

The IMEC Clean Concept : An Advanced Wafer Cleaning Technology

Marc Heyns, Marc Meuris, Ara Philipossian, 1994 .

Advanced mask cleaning techniques for sub-100-nm technology nodes

Roman Gouk, Steven Verhaverbeke, James S. Papanu, 2005, SPIE Photomask Technology.

The Formation of Terraces and Steps on Si(100) Surfaces and the Change of these Surfaces during Wet Processing

Tadahiro Ohmi, 大見忠弘, Steven Verhaverbeke, 1994 .

Advanced processes for photomask damage-free cleaning and photoresist removal

Roman Gouk, Steven Verhaverbeke, James S. Papanu, 2006, European Mask and Lithography Conference.

The Role of HO 2 − in SC-1 Cleaning Solutions

Steven Verhaverbeke, Jennifer Ware Parker, Chris F. McConnell, 1997 .

Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning

Roman Gouk, Steven Verhaverbeke, Dennis J. Yost, 2005 .

Hydrogen Passivation of HF ‐ Last Cleaned (100) Silicon Surfaces Investigated by Multiple Internal Reflection Infrared Spectroscopy

Hugo Bender, Steven Verhaverbeke, H. Bender, 1994 .

Single-wafer, short cycle time wet clean technology

Steven Verhaverbeke, Satheesh Kuppurao, Christopher Beaudry, 2002 .

A Model for the Etching of Ti and Tin in SC-1 Solutions

Steven Verhaverbeke, Jennifer Ware Parker, 1997 .

Investigating techniques to improve gate-oxide integrity

Marc Heyns, Marc Meuris, Ara Philipossian, 1992 .