Andreas Erdmann

发表

Do we need complex resist models for predictive simulation of lithographic process performance?

Bernd Tollkuhn, Andreas Erdmann, Jeroen Lammers, 2004, SPIE Advanced Lithography.

Enhanced model for the efficient 2D and 3D simulation of defective EUV masks

Andreas Erdmann, Peter Evanschitzky, 2004, SPIE Advanced Lithography.

Simulation of extreme ultraviolet masks with defective multilayers

Andreas Erdmann, Peter Evanschitzky, M. Besacier, 2003, Photomask Japan.

Application of artificial neural networks to compact mask models in optical lithography simulation

Andreas Erdmann, Peter Evanschitzky, Viviana Agudelo, 2013 .

Lithography simulation: modeling techniques and selected applications

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2009, Optical Metrology.

Topography effects and wave aberrations in advanced PSM technology

Andreas Erdmann, A. Erdmann, 2001, SPIE Advanced Lithography.

EUV mask simulation for AIMS

Andreas Erdmann, Peter Evanschitzky, Norbert Rosenkranz, 2003, SPIE Photomask Technology.

A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography

Andreas Erdmann, Thomas Schnattinger, 2008, SPIE Advanced Lithography.

Optimization of mask absorber stacks and illumination settings for contact hole imaging

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2008, Photomask Japan.

Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects (Invited Paper)

Andreas Erdmann, A. Erdmann, 2005, Other Conferences.

A fast development simulation algorithm for discrete resist models

Andreas Erdmann, Thomas Schnattinger, E. Bär, 2006 .

Extreme ultraviolet multilayer defect analysis and geometry reconstruction

Andreas Erdmann, Peter Evanschitzky, Dongbo Xu, 2016 .

Modeling of exploration of reversible contrast enhancement layers for double exposure lithography

Feng Shao, Andreas Erdmann, Gregory D. Cooper, 2010, Advanced Lithography.

Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems

Gabriella Kókai, Andreas Erdmann, Tim Fühner, 2004, EvoWorkshops.

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2018 .

3D mask effects in high NA EUV imaging

Timon Fliervoet, Andreas Erdmann, Peter Evanschitzky, 2019, Advanced Lithography.

Rigorous simulation of exposure over nonplanar wafers

Takashi Sato, Thomas Schmoeller, Christian K. Kalus, 2003, SPIE Advanced Lithography.

Direct optimization approach for lithographic process conditions

Andreas Erdmann, Sebastian Seifert, Tim Fühner, 2007 .

Characterization of the scattering effect of complex mask geometries with surface roughness

Andreas Erdmann, Christoph Pflaum, Zhabiz Rahimi, 2010, Photonics Europe.

Efficient simulation of EUV pellicles

Andreas Erdmann, Peter Evanschitzky, A. Erdmann, 2017, Photomask Technology.

Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach

Christoph Dürr, Andreas Erdmann, Tim Fühner, 2006, SPIE Advanced Lithography.

Special Section Guest Editorial:Extending VLSI and Alternative Technology with Optical and Complementary Lithography

Andreas Erdmann, Kafai Lai, 2016 .

Accurate determination of 3D PSF and resist effects in grayscale laser lithography

Andreas Erdmann, Holger Sailer, Temitope Onanuga, 2018, European Mask and Lithography Conference.

A simulation study on the impact of lithographic process variations on CMOS device performance

Ina Kodrasi, Andreas Erdmann, Tim Fühner, 2008, SPIE Advanced Lithography.

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

Xiaolei Liu, Sikun Li, Andreas Erdmann, 2014 .

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

Vicky Philipsen, Eric Hendrickx, Frank Scholze, 2018, Photomask Technology.

Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2008, European Mask and Lithography Conference.

Mutual source, mask and projector pupil optimization

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2012, Advanced Lithography.

Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

Peter De Bisschop, Vicky Philipsen, Andreas Erdmann, 2007, SPIE Photomask Technology.

Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm

Andreas Erdmann, Tim Fuhner, 2004, SPIE Advanced Lithography.

Simplified resist models for efficient simulation of contact holes and line ends

Andreas Erdmann, Armin Semmler, Bernd Tollkuhn, 2005 .

Imaging characteristics of binary and phase shift masks for EUV projection lithography

Andreas Erdmann, Peter Evanschitzky, 2012, Optical Systems Design.

Simulation flow and model verification for laser direct-write lithography

Andreas Erdmann, Temitope Onanuga, M. Rumler, 2017 .

Modeling strategies for EUV mask multilayer defect dispositioning and repair

Andreas Erdmann, Peter Evanschitzky, Tristan Bret, 2013, Advanced Lithography.

Simulation study of illumination effects in high-NA EUV lithography

Andreas Erdmann, Peter Evanschitzky, Eelco van Setten, 2018, Optical Systems Design.

Efficient simulation of EUV multilayer defects with rigorous data base approach

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2012, Photomask Technology.

Will Darwin's law help us to improve our resist models?

Bernd Tollkuhn, Andreas Erdmann, Armin Semmler, 2003, SPIE Advanced Lithography.

Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios

Cheng-Bai Xu, Andreas Erdmann, Peter Evanschitzky, 2008, SPIE Advanced Lithography.

Accuracy and performance of 3D mask models in optical projection lithography

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2011, Advanced Lithography.

Modeling of block copolymer dry etching for directed self-assembly lithography

Andreas Erdmann, Zelalem Tamrate Belete, Eberhard Baer, 2018, Advanced Lithography.

Advanced EUV mask and imaging modeling

Andreas Erdmann, Peter Evanschitzky, A. Erdmann, 2017 .

Beam-propagation analysis of magneto-optic waveguide couplers

Andreas Erdmann, 1994, Integrated Optoelectronics.

Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Ronald L. Gordon, Christian K. Kalus, Andreas Erdmann, 2000, Advanced Lithography.

Dr.LiTHO: a development and research lithography simulator

Andreas Erdmann, Tim Fühner, Thomas Schnattinger, 2007, SPIE Advanced Lithography.

Reducing EUV mask 3D effects by alternative metal absorbers

Vicky Philipsen, Eric Hendrickx, Frank Scholze, 2017, Advanced Lithography.

Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2010, European Mask and Lithography Conference.

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

An integrated source/mask/DSA optimization approach

Ulrich Welling, Andreas Erdmann, Tim Fühner, 2016, Advanced Lithography.

Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography

Peter De Bisschop, Andreas Erdmann, Andreas Rathsfeld, 2004, SPIE Advanced Lithography.

Some aspects of thick film resist performance and modeling

Clifford L. Henderson, Andreas Erdmann, Ralph R. Dammel, 1998, Advanced Lithography.

Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Andreas Erdmann, Peter Evanschitzky, Jürgen Lorenz, 2011, Photomask Technology.

Mask absorber for next generation EUV lithography

Patrick Jaenen, Vicky Philipsen, Victor Soltwisch, 2020, Photomask Technology.

Rigorous simulation of defective EUV multilayer masks

Thomas Schmoeller, Christian K. Kalus, Andreas Erdmann, 2003, SPIE Photomask Technology.

Verminderung des Produkteinführungsrisikos durch Virtual Reality-unterstützte Konzepttests: eine experimentelle Studie zur Durchführung von VR-Car Clinics

Andreas Erdmann, 1999 .

Compensation of mask induced aberrations by projector wavefront control

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2011, Advanced Lithography.

Increasing the predictability of AIMS measurements by coupling to resist simulations

Peter De Bisschop, Vicky Philipsen, Andreas Erdmann, 2008, Photomask Japan.

In situ aberration measurement method using a phase-shift ring mask

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2014, Advanced Lithography.

Efficient simulation and optimization of wafer topographies in double patterning

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2009, Advanced Lithography.

Simulation of optical lithography

Andreas Erdmann, Wolfgang Henke, A. Erdmann, 1999, Other Conferences.

Application of deep learning algorithms for Lithographic mask characterization

Andreas Erdmann, Andreas Maier, Dereje Shewaseged Woldeamanual, 2018, Optical Systems Design.

Modeling parameter extraction for DNQ-novolak thick film resists

Clifford L. Henderson, Andreas Erdmann, Ralph R. Dammel, 1998, Advanced Lithography.

Special Section Guest Editorial: Continuation of Scaling with Optical and Complementary Lithography

Andreas Erdmann, Kafai Lai, 2015 .

Simulation and optimization of holographically exposed photoresist gratings

Andreas Erdmann, M. Weiss, Andreas Gombert, 1999, Other Conferences.

Advances in lithography: introduction to the feature.

Bruce W. Smith, Bruce Smith, Andreas Erdmann, 2014, Applied optics.

Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes

Feng Shao, Peter Trefonas, Andreas Erdmann, 2010, Advanced Lithography.

Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask

Peter De Bisschop, Vicky Philipsen, Andreas Erdmann, 2006, SPIE Advanced Lithography.

Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2013 .

Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

Feng Shao, Eric Hendrickx, Gian F. Lorusso, 2011, Optical Systems Design.

A physical model for innovative laser direct write lithography

Andreas Erdmann, Temitope Onanuga, M. Rumler, 2017, Advanced Lithography.

Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2010, Photomask Japan.

Genetic Algorithm for Optimization and Calibration in Process Simulation

Andreas Erdmann, Tim Fühner, Jürgen Lorenz, 2004 .

Rigorous simulation and optimization of the lithography/directed self-assembly co-process

Ulrich Welling, Andreas Erdmann, Tim Fühner, 2014, Advanced Lithography.

Lithographic process window optimization for mask aligner proximity lithography

Reinhard Voelkel, Andreas Erdmann, Juergen Brugger, 2014, Advanced Lithography.

Simulation of larger mask areas using the waveguide method with fast decomposition technique

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2007, SPIE Photomask Technology.

In situ aberration measurement technique based on quadratic Zernike model

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2012, Optical Systems Design.

Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Xiaolei Liu, Sikun Li, Andreas Erdmann, 2014, Advanced Lithography.

Advanced mask aligner lithography (AMALITH)

Reinhard Voelkel, Andreas Erdmann, Uwe D. Zeitner, 2012, Advanced Lithography.

Modification of boundaries conditions in the FDTD algorithm for EUV mask modeling

Thomas Schmoeller, Christian K. Kalus, Andreas Erdmann, 2002, Photomask Japan.

Accurate extraction of maximum current densities from the layout

Andreas Erdmann, Thomas Schnattinger, Hans Hartmann, 2006 .

Application of the transport of intensity equation to EUV multilayer defect analysis

Andreas Erdmann, Peter Evanschitzky, Dongbo Xu, 2015, Advanced Lithography.

Rigorous diffraction analysis for future mask technology

Andreas Erdmann, Christoph Friedrich, C. Friedrich, 2000, Advanced Lithography.

Analytical model for EUV mask diffraction field calculation

Andreas Erdmann, Xiangzhao Wang, Peng Bu, 2011, Optical Systems Design.

Defect printability study using EUV lithography

Adam R. Pawloski, Andreas Erdmann, Bruno La Fontaine, 2006, SPIE Advanced Lithography.

Influence of optical nonlinearities of the photoresist on the photolithographic process: applications

Clifford L. Henderson, Andreas Erdmann, C. Grant Willson, 1997, Advanced Lithography.

Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques

Thomas Schmoeller, Christian K. Kalus, Andreas Erdmann, 2003, SPIE Advanced Lithography.

Particle on EUV pellicles, impact on LWR

Gijsbert Rispens, Michiel Kupers, Andreas Erdmann, 2019, Photomask Technology.

The impact of the mask stack and its optical parameters on the imaging performance

Andreas Erdmann, Peter Evanschitzky, Sebastian Seifert, 2007, SPIE Advanced Lithography.

In situ aberration measurement technique based on an aerial image with an optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

Rigorous simulation of lithographic exposure of photoresist over a nonplanar wafer

Christian K. Kalus, Andreas Erdmann, 2003, International Commission for Optics.

Application of artificial neural networks to compact mask models in optical lithography simulation

Andreas Erdmann, Peter Evanschitzky, Viviana Agudelo, 2013, Advanced Lithography.

Defect parameters retrieval based on optical projection images

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2013, Optical Metrology.

Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

Vicky Philipsen, Eric Hendrickx, Frank Scholze, 2017 .

Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach

Andreas Erdmann, Xiaofei Wu, Tim Fuhner, 2016, 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).

Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems

Peter De Bisschop, Andreas Erdmann, Peter Evanschitzky, 2006, Photomask Japan.

2015 SYSTEMS DESIGN

Michel Lequime, Angela Duparré, Roland Geyl, 2015 .

Simulation-based EUV source and mask optimization

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2008, Photomask Technology.

Incorporating photomask shape uncertainty in computational lithography

Edmund Y. Lam, Andreas Erdmann, Xiaofei Wu, 2016, Advanced Lithography.

Toward automatic mask and source optimization for optical lithography

Andreas Erdmann, Bernd Tollkuehn, Tim Fuehner, 2004, SPIE Advanced Lithography.

Lithographic process simulation for scanners

Michael Arnz, Jan Baselmans, Mireille Maenhoudt, 1998, Advanced Lithography.

In situ aberration measurement technique based on aerial image with optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2012, Optical Systems Design.

Mask and wafer topography effects in immersion lithography

Peter De Bisschop, Andreas Erdmann, Peter Evanschitzky, 2005, SPIE Advanced Lithography.

Adaptive denoising method to improve aberration measurement performance

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

Edmund Y. Lam, Andreas Erdmann, Tim Fühner, 2017 .

Influence of optical nonlinearities of the photoresist on the photolithographic process: basics

Clifford L. Henderson, Andreas Erdmann, C. Grant Willson, 1997, Advanced Lithography.

A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2014, Advanced Lithography.

Advances in lithography: introduction to the feature.

Bruce Smith, Andreas Erdmann, Apo Sezginer, 2014, Journal of the Optical Society of America. A, Optics, image science, and vision.

Mask absorber development to enable next-generation EUVL

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2019, Photomask Japan.

Modeling and Simulation

Andreas Erdmann, Andreas Erdmann, A. Erdmann, 2005 .

Benchmark of a lithography simulation tool for next generation applications

Bernd Tollkuhn, Andreas Erdmann, Klaus Gärtner, 2006 .

Correlation analysis: a fast and reliable method for a better understanding of simulation models in optical lithography

Andreas Erdmann, Anne Heubner, Klaus Elian, 2005, SPIE Advanced Lithography.

Source mask optimization using real-coded genetic algorithms

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2013, Advanced Lithography.

Mask diffraction analysis and optimization for EUV masks

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2009, Advanced Lithography.

Exploration of linear and non-linear double exposure techniques by simulation

Feng Shao, John S. Petersen, Andreas Erdmann, 2009, Advanced Lithography.

Rigorous EMF simulation of absorber shape variations and their impact on lithographic processes

Andreas Erdmann, Christoph Pflaum, Zhabiz Rahimi, 2010, European Mask and Lithography Conference.

Attenuated PSM for EUV: Can they mitigate 3D mask effects?

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2018, Advanced Lithography.

Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography

Andreas Erdmann, Peter Evanschitzky, Viviana Agudelo, 2012, Advanced Lithography.

Topography-aware BARC optimization for double patterning

Feng Shao, Shijie Liu, Andreas Erdmann, 2010, Advanced Lithography.

Application of Principal Component Analysis to EUV multilayer defect printing

Andreas Erdmann, Peter Evanschitzky, Dongbo Xu, 2015, SPIE Optical Systems Design.

Innovations in structured thin film design and fabrication for optical applications

Jianda Shao, Zhengxiu Fan, Andreas Erdmann, 2010, International Conference on Thin Film Physics and Applications.

Rigorous simulation of alignment for microlithography

Andreas Erdmann, Nikolay I. Nikolaev, A. Erdmann, 2003 .

Fast near field simulation of optical and EUV masks using the waveguide method

Andreas Erdmann, Peter Evanschitzky, A. Erdmann, 2007, European Mask and Lithography Conference.

New methods to calibrate simulation parameters for chemically amplified resists

Tsann-Bim Chiou, Anita Fumar-Pici, Doris Kang, 2002, SPIE Advanced Lithography.

Computational algorithms for optimizing mask layouts in proximity printing

Reinhard Voelkel, Andreas Erdmann, Uwe Vogler, 2011 .

Memetic Algorithms Parametric Optimization for Microlithography

Gabriella Kókai, Bernd Tollkuhn, Andreas Erdmann, 2007 .

Stochastic Effects in Advanced Lithography

Andreas Erdmann, 2021 .

Modeling of grayscale lithography and calibration with experimental data for blazed gratings

Robert Leitel, Andreas Erdmann, Pankaj Bhardwaj, 2021, Optical Systems Design.

Modeling the impact of shrinkage effects on photoresist development

Thomas Mülders, Hans-Jürgen Stock, Andreas Erdmann, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Simulation of polychromatic effects in high NA EUV lithography

Vicky Philipsen, Victor Soltwisch, Andreas Erdmann, 2021, Photomask Technology.

Overview of Lithographic Processing

Andreas Erdmann, 2021 .

Optical Lithography Beyond Projection Imaging

Andreas Erdmann, 2021 .

Material-Driven Resolution Enhancements

Andreas Erdmann, 2021 .

Mask defect detection with hybrid deep learning network

Andreas Erdmann, Peter Evanschitzky, Tilmann Heil, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Study of novel EUVL mask absorber candidates

Patrick Jaenen, Vicky Philipsen, Victor Soltwisch, 2021 .

Accurate prediction of EUV lithographic images using data-efficient generative networks

Andreas Erdmann, Andreas Rosskopf, Abdalaziz Awad, 2021, Computational Optics 2021.

Image Formation in Projection Lithography

Andreas Erdmann, 2021 .

Accurate prediction of EUV lithographic images and 3D mask effects using generative networks

Andreas Erdmann, Peter Evanschitzky, Andreas Rosskopf, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Optical Resolution Enhancements

Andreas Erdmann, 2021 .

Investigation of waveguide modes in EUV mask absorbers

Andreas Erdmann, Peter Evanschitzky, Eelco van Setten, 2021 .

Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography

Peter De Bisschop, Ulrich Welling, Andreas Erdmann, 2021 .

Pixel-based defect detection from high-NA optical projection images.

Andreas Erdmann, Tim Fühner, Dongbo Xu, 2014, Applied optics.

Introduction to the special issue on optical lithography

Masato Shibuya, Andreas Erdmann, 2015 .

Rigorous diffraction simulations of topographic wafer stacks in double patterning

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2009 .

Rigorous electromagnetic field simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Andreas Erdmann, Peter Evanschitzky, J. Lorenz, 2012 .

A model of self-limiting residual acid diffusion for pattern doubling

Andreas Erdmann, Charles R. Szmanda, André Fiebach, 2009 .

Three-dimensional resist development simulation with discrete models

Andreas Erdmann, Thomas Schnattinger, E. Bär, 2006 .

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2017 .

Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography (Conference Presentation)

Vicky Philipsen, Andreas Erdmann, Peter Evanschitzky, 2020, Extreme Ultraviolet (EUV) Lithography XI.

Fine-tuned profile simulation of holographically exposed photoresist gratings

Andreas Erdmann, Andreas Gombert, Ch. Zanke, 1998 .

Advanced lithography models for strict process control in the 32nm technology node

Evangelos Gogolides, Andreas Erdmann, Ioannis Raptis, 2009 .

Efficient simulation and optimization of wafer topographies in double patterning

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2009 .

Mask diffraction analysis and optimization for extreme ultraviolet masks

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2010 .