K. Nakajima

Storage management software for mainframe and UNIX : Storage devices & systems

K. Suzuki, K. Nakajima, 1995 .

One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing

K. Nakajima, Y. Yamada, T. Tamura, 1997, Advanced Lithography.

ISSCC 93 / SESSION 3 / NON-VOLATILE, DYNAMIC, AND EXPERIMENTAL MEMORIES / PAPER WP 3.5

K. Nakajima, Koichiro Furuta, Takanori Saeki, 1993 .

Optimization of pattern shape in electron-beam cell projection lithography

K. Nakajima, Hiroshi Yamashita, Takahiro Ema, 1998, Advanced Lithography.

0.15-μm pattern formation using cell projection electron-beam direct writing with variable shot size

K. Nakajima, Takao Tamura, Hiroshi Yamashita, 1997, Advanced Lithography.

Mask bias effects in e-beam cell projection lithography

K. Nakajima, Hiroshi Yamashita, Takahiro Ema, 1997, Photomask and Next Generation Lithography Mask Technology.