Philipp Jaschinsky

Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write

László Szikszai, Philipp Jaschinsky, Katja Keil, 2009, Advanced Lithography.

Practical resist model calibration for e-beam direct write processes

Hans-Jürgen Stock, Philipp Jaschinsky, Manuela Gutsch, 2010, Photomask Japan.

Feasibility study of optical/e-beam complementary lithography

Philipp Jaschinsky, Christoph Hohle, Manuela Gutsch, 2012, Advanced Lithography.

Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write

M. Tesauro, C. Hohle, Philipp Jaschinsky, 2009, European Mask and Lithography Conference.

Conventional and reversed image printing in electron beam direct write lithography with proximity effect corrections based on dose and shape modification

Philipp Jaschinsky, Katja Keil, Christoph Hohle, 2010, Advanced Lithography.

Checkerboard pattern for PSF parameter determination in electron beam lithography

Philipp Jaschinsky, Katja Keil, Marc Hauptmann, 2010, European Mask and Lithography Conference.

Nanoscale charge transport measurements using a double-tip scanning tunneling microscope

Philipp Jaschinsky, Mihail Ion Lepsa, Bert Voigtländer, 2008 .